Extreme ultraviolet (EUV) lithography is a cutting-edge technology used in semiconductor manufacturing to create smaller and more advanced integrated circuits. EUV lithography uses light with a wavelength of around 13.5 nanometers, which is much shorter than traditional lithography techniques. This enables the production of smaller features on semiconductor chips, leading to increased performance and efficiency. EUV lithography is a complex and highly precise process that requires specialized equipment and materials, and is crucial for advancing the capabilities of modern electronic devices.