Photolithography is a key process in the semiconductor industry used for the fabrication of integrated circuits. It involves using light to transfer a geometric pattern from a photomask, also known as a mask or reticle, onto a substrate coated with photoresist. The photoresist is a light-sensitive material that undergoes chemical changes when exposed to light, allowing for the creation of precise patterns on the substrate. Photolithography is a critical step in the manufacturing of semiconductor devices as it defines the layout of transistors, interconnects, and other components on the silicon wafer. It enables the precise patterning of features at the nanometer scale, allowing for the production of complex and highly integrated electronic devices. Advancements in photolithography technology, such as the development of deep ultraviolet and extreme ultraviolet lithography, have continuously pushed the limits of semiconductor manufacturing, enabling the production of smaller and more powerful chips. Overall, photolithography plays a crucial role in the advancement of the semiconductor industry and the development of cutting-edge electronic devices.